ESOLwas established in 2018 with the goal of providing customers with the world's best EUV solution based on innovative technology. EUV is a key technology leading the manufacturing of semiconductors with the highest performance. ESOL will provide customers with innovative technology that is ahead of the times based on its excellent understanding of lithography and mask technology. ESOL will help customers succeed by providing them with innovative EUV technology, which is ESOL's best value.
FREM
FREM is an economical EUV defect review facility that breaks the fixed principle of existing EUV equipment and approaches it in an in novative way
Key Features
- Low cost of ownership of EUV mask imaging
- Long MTBF and Short MTTR
- Small foot print
- High extendibility to future node
EPTR
EPTR is a tool providesmassive transmittance and reflectance data of EUV Pellicle. It can measure the transmittance and reflectance of the entire EUV Pellicle at a very high speed.
Key Features
- High speed and massive measurements of EUV transmittance and reflectivity
