Wet Bench Equipment-WS Series

The WS (Wet Station) series is a state-of-the-art, cost-effective wafer processing system solution capable of processing up to 50 wafers in a batch, with multiple tanks suitable for a wide range of chemistries. It supports traditional wet processes such as pre-film clean, etch, post-etch clean, and photoresist stripping. Newly developed features enable batch processing with a smaller footprint, superior productivity, and exceptional cleaning results.

• Customized hardware and software
• Transfer options: Cassette-less, Cassette-type, or Boat-type
• Multi-functional dryer options
• Excellent particle removal
• Excellent etching uniformity

WS series batch wafer wet process equipment can be applied in the following fields:

• Semiconductor FEoL (Front-End-of-Line)
• Semiconductor advanced packaging process
• Compound semiconductor processes (SiC / GaN / GaAs / InP / …)
• MEMS (Micro-Electro-Mechanical Systems)
• LED / Mini LED / Micro LED

The application process is as follows:

• Etch: Metal, Oxide removed, Nitride removed
• Stripper: PR/PI strip, Polymer remove
• Clean: Pre-clean, Post clean, Flux clean
• Electro-less Plating: Zn/Ni/Pd/Au