SCIL's technology began to take shape at Philips Research in 2001, and in 2015, Philips Research and Philips Intellectual Property & Standards decided to move the technology from "laboratory research and development" to "industrial mass production." SCIL Nanoimprint Solutions was thus born. Its first step was to design and build a fully automated machine specifically for imprinting nanopatterns onto substrates. The SCIL team gradually grew into a cross-disciplinary professional team. In 2023, SCIL Nanoimprint Solutions received funding from institutions across Europe and officially spin-out from Philips, embarking on a new path of development.
AutoSCIL
AutoSCIL is an all-in-one system designed for laboratory research and development, process development, proof-of-concept (PoC) and pilot runs. Hardware and space design: It adopts a highly integrated enclosed chassis design, integrating all core functions such as wafer handling, pre-alignment, photoresist spin coating, capillary imprinting, and baking into a single machine space. Its small footprint makes it ideal for deployment in space-constrained R&D cleanrooms.
Features
- Up to 700 imprints can be achieved with a single stamp, significantly reducing production costs compared to conventional technologies.
- The proprietary resist features rapid curing without the need for additional UV exposure. Its high etching selectivity also eliminates the need for traditional hard masks (hard mask - SiO2, Si3N4, etc.), saving both process steps and costs for the production line.
- Direct face-to-face flat-press imprinting delivers significantly higher alignment accuracy compared to the rolling method.
FabSCIL
Briefly
- FabSCIL is a high-end lithography system designed for high-volume production.
- Breaking away from the limitations of standalone systems, it adopts an advanced cluster design. The entire system consists of multiple independent process modules connected in series, including multiple independent spin-coating modules, curing/baking modules, and a central high-efficiency robotic arm. This architecture allows customers to "freely configure and expand" the system according to production line capacity bottlenecks to achieve maximum overall equipment efficiency (OEE).
Features
- Up to 700 imprints can be achieved with a single stamp, significantly reducing production costs compared to conventional technologies.
- The proprietary resist features rapid curing without the need for additional UV exposure. Its high etching selectivity also eliminates the need for traditional hard masks (hard mask - SiO2, Si3N4, etc.), saving both process steps and costs for the production line.
- Direct face-to-face flat-press imprinting delivers significantly higher alignment accuracy compared to the rolling method.
