High-quality and high-performance systems for research and production, including RTP (Rapid Thermal Processing), RTA (Rapid Thermal Annealing), RTCVD (Rapid Thermal Chemical Vapor Deposition), and ALD (Atomic Layer Deposition).
RTP & PTA
Rapid Thermal Processing
Production tools equipped with automatic loading systems designed for compound semiconductor applications. Suitable for MEMS, sensors, LEDs, laser diodes, optoelectronics, telecommunication devices, power and discrete devices, micro-batteries, nanotechnologies, and more.
Direct Liquid Injection CVD
A highly efficient technology for depositing advanced materials using virtually any element from the periodic table. Ideal for semiconductors, micro-batteries, BAW and SAW filters, thermal and anti-corrosion barriers, bio-compatible coatings, and beyond.
Typical Applications and Materials
Multi-metallic oxides, 2D materials, nitrides, metals, and alloys.
Examples include: LiNbO₃, LaNiO₃, SrTiO₃, BaO, Y₂O₃, Cr₂O₃, TiO₂, Al₂O₃, HfO₂, Bi₂O₃, Co₃O₄, CuCrO₂, SiO₂, TiN, AlN, Pt, MoS₂.
