批次濕製程機台

2002年,辛耘企業投入批次式濕製程設備研發製造,已經獲得國內外客戶採用與肯定。目前辛耘擁有 5,000㎡ 生產製造廠房,還擁有 Class10等級無塵室服務客戶製程驗證。產品包含手動 / 半自動 / 全自動的批次濕製程設備,提供客戶2”~12”製程應用需求。特有的 cassette type / boat type / cassette-less type 技術提供半導體晶圓、藍寶石、玻璃、太陽能晶圓、薄化晶圓等等..的應用。此外,專利產品 Advantech Dry 提供客戶各種關鍵乾燥的製程應用。

應用
  • Wet Bench for Front-end Semiconductor RCA Clean / Etching / PR Strip / Reclaim / Mask Cleaner
  • Wet Bench for Back-end Semiconductor Clean / Etching / PR Strip / Plating / Developer / Mask Cleaner / Electro-less Plating
  • Wet Bench for MEMS Clean / PR Strip / Si Etching / Oxide Release / Electro-less Plating
  • Wet Bench for GaAs Clean / PR Strip / Metal Lift-Off / Electro-less Plating / Etching
  • Wet Bench for LED High Temperature Phosphoric Acid Etching / KOH Etching / ITO / BOE / SPM / HCl Etching / PR Strip / Developer
  • Wet Bench for Solar Cell Texture
  • Advantech Dryer
  • Wet Bench for Parts / Tube Clean
  • Chemical Supply System
  • OEM for Tools