Rapid Thermal Processing
Production tools with automatic loading system for compound semiconductor applications. MEMS, sensors, LEDs, laser diodes, optoelectronics, telecommunication devices, power and discrete devices, micro-batteries, nanotechnologies, etc.
Direct Liquid Injection CVD
The most efficient technology for the deposition of new materials using any element of the periodic table.Semiconductor, micro batteries, BAW and SAW filters, thermal and anti-corrosion barriers, bio compatible layers, etc. Multi-metallic oxides,  2D materials. Nitrides, metals, and alloys, etc.
Examples of deposited materials: LiNbO3, LaNiO3, SrTiO3, BaO,  Y2O3,  Cr2O3,  TiO2,  Al2O3,  HfO2,  Bi2O3, Co3O4, CuCrO2, SiO2, TiN,  AlN,  Pt, MoS2 …

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