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  LCD - SMEE - SSB245/10 Projection Lithography

SSB245/10 Projection Lithography
SSB245/10 Projection Lithography is specially designed for TFT process on substrates geometry up to 730mmx920mm to meet mass production of G4.5 fab and various needs from customer.
Main Features:
icon 1.Modular design, scalable and dynamic stepper platform
2.High performance system delivering a resolution of 2um
3.Exposure of 6-inch mask to ensure low cost of ownership
4.Suitable for G4.5 fab with glass substrate size up to 730mmx920mm
5.UNIX operation system with good reliability
6.SEMI standard supporting process data synchronous between equipments and fab automation platform
Standard Certification:
icon TFT-LCD & OLED Array lithography process
icon 1.Resolution <2um
2.Exposure Light Source i-line mercury lamp
3.Substrate Dimension 730mm × 920mm
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