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  Semiconductor III-V Group - Piotech - PF-300T

12-inch PECVD equipment PF-300T
1. Original design with 100% own intellectual properties (IP)
2. Unique platform design enables worlds leading productivity & CoO
3. Used for the production of 90-95 nanometer integrated circuit
4. Capable to extend technologically to 32 to 45 nanometers
Main Features:
icon 1. Optional 8 conversion kit
2. Unique platform structure design allows the equipment to become a leading capacity in the world
Standard Certification:
icon 1. Company obtained certificates of ISO9001BISO14001BOHSAS18001
2. Products obtained certificates of SEMI S2 and F47
icon 1. High-quality process of SiO2, SiN, SiON, and TEOS oxide films
2. Low temperature]200J^process ready for TSV applications
3. Low-k capable
icon 1. Automation PECVD equipment
2. Single-chamber PECVD equipment
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