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Spin Rinse Dryer (SRD) for 75-200mm Substrates
The Trident family of Spin Rinse Dryers (SRDs) provides the state of the art in cleaning, rinsing and drying wafers after wet processing. The systems' non-contact heating results in cleaner N2 because it places a filter after the heater and eliminates direct contact between N2 and heater.
Trident SRDs also use ultra-pure valves and fittings throughout, and all systems include a comprehensive facility panel to precisely control all pressures and flows. These are typical of the design advances and efficiencies that give Trident Spin Rinse Dryer its uniquely attractive performance-to-price value.
ClassOne Trident Spin Rinse Dryers are available in bench-top and roll-around single-stack units and in dual-stack configurations, for processing up to 50 substrates per batch in sizes of 75mm to 200mm, depending upon the model, bowl size and rotor used.
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| Main Features: |
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￭ Stainless Steel Cabinetry
￭ Negative-Pressure Motor Seal
￭ Non-Contact Ultra-Pure N2 Heater
￭ Uniform Water Spray
￭ Full-Control Facility Panel
￭ Door-top DC Ionizer
￭ Full Wrap-Around Bowl Heater
￭ PLC Control with Color Touch Screen
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| Standard Certification: |
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Solstice Plating System
Best of West Winner
Semicon West 2015
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| Application: |
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Processes for Spray Solvent Tools
￭ Spin, Rinse, and Dry semiconductor wafers without leaving water spots and films after a wet process
￭ Chemical or residue removal
￭ Cleaning up to 200mm wafers utilizing DI Water Rinse, followed by heated N2 dry
Major Benefits
￭ FM4910 compliance
￭ Much cleaner seal, reduced particles
￭ Cleaner N2
￭ Uniform rinse, no nozzle replacement
￭ Precise control of flows and pressures
￭ Reduced particles
￭ Optimum drying performance
￭ All Spin Rinse Dryer components readily available
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| Specification: |
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Semiconductor III-V Group - ClassOne - Trident™ Spin Rinse Dryer
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