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  Semiconductor III-V Group - ClassOne - Trident™ Spin Rinse Dryer

Trident™ Spin Rinse Dryer
Spin Rinse Dryer (SRD) for 75-200mm Substrates
The Trident family of Spin Rinse Dryers (SRDs) provides the state of the art in cleaning, rinsing and drying wafers after wet processing. The systems' non-contact heating results in cleaner N2 because it places a filter after the heater and eliminates direct contact between N2 and heater.
Trident SRDs also use ultra-pure valves and fittings throughout, and all systems include a comprehensive facility panel to precisely control all pressures and flows. These are typical of the design advances and efficiencies that give Trident Spin Rinse Dryer its uniquely attractive performance-to-price value.
ClassOne Trident Spin Rinse Dryers are available in bench-top and roll-around single-stack units and in dual-stack configurations, for processing up to 50 substrates per batch in sizes of 75mm to 200mm, depending upon the model, bowl size and rotor used.
Main Features:
■ Stainless Steel Cabinetry
■ Negative-Pressure Motor Seal
■ Non-Contact Ultra-Pure N2 Heater
■ Uniform Water Spray
■ Full-Control Facility Panel
■ Door-top DC Ionizer
■ Full Wrap-Around Bowl Heater
■ PLC Control with Color Touch Screen
Standard Certification:
icon Solstice Plating System
Best of West Winner
Semicon West 2015
Processes for Spray Solvent Tools
■ Spin, Rinse, and Dry semiconductor wafers without leaving water spots and films after a wet process
■ Chemical or residue removal
■ Cleaning up to 200mm wafers utilizing DI Water Rinse, followed by heated N2 dry
Major Benefits
■ FM4910 compliance
■ Much cleaner seal, reduced particles
■ Cleaner N2
■ Uniform rinse, no nozzle replacement
■ Precise control of flows and pressures
■ Reduced particles
■ Optimum drying performance
■ All Spin Rinse Dryer components readily available
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