Scientech Corporation  

Chemistry and Biotechnology
Broadcast Equipment
Semiconductor III-V Group
arrow2 ATEN
arrow2 Auros
arrow2 ClassOne
arrow2 Dawonsys
arrow2 E-SOL
arrow2 FRT
arrow2 hfsemi
arrow2 HPSP
arrow2 IMT
arrow2 Genmark
arrow2 Kensington
arrow2 Kingsemi
arrow2 Kitec
arrow2 KLA
arrow2 Micro Image
arrow2 Microtome
arrow2 M Napra
arrow2 Muetec
arrow2 Nanonex
arrow2 Neutronix Quintel
arrow2 NGR
arrow2 Nordson
arrow2 Nova
arrow2 Piotech
arrow2 Plasma-Therm
arrow2 Rave
arrow2 Scientech
arrow2 SEMES
arrow2 SiGlaz
arrow2 Sinyang
arrow2 SMEE
arrow2 Tera
arrow2 TMC
arrow2 TOHO
arrow2 TOWA
arrow2 UCP
arrow2 Ulvac
arrow2 Ushio
arrow2 Verity
arrow2 VLSI
arrow2 YES
arrow2 Zeiss
PCB Industry
Packaging & Testing
Used Tool
Scientech Tool
3D Printer
  Semiconductor III-V Group - E-SOL, Inc. - MLA500

Laser heat treatment of EUV mask for semiconductor lithography process.
Main Features:
icon Simpler than chemical method, reducing # of process steps.
icon Do not deform the multilayer structure.
Standard Certification:
icon Laser heat treatment of EUV mask for semiconductor lithography process.
icon 1. Laser:
 - Type:CW (pulse, on/off control)
 - Shape: Square(Top -hat)
 - Wave length:IR
2. SMIF & User Interface
 - SMIF: Mask loading /unloading (Mask size: 6 inch.)
 - Number of stage & load : 1 stage & 1 load port
 - Mini Environment enclose (class 1)
3. High Precision stage(XY-ZT stage)
 - Accuracy of stage:<±1um
 - Repeatability accurancy <:<±0.3um
4. Optic Module:
 - Beam shaping optic (E-SOL patent)
 - Fine alignment optic
 - Real-time beam power & shape monitoring optic
 - Auto focus optic
Copyright © 2009 SCIENTECH. All rights reserved. Site map