NAURA has achieved a major breakthrough in the sputter source, plasma generation and control technology, chamber design and simulation technology, a number of key technology areas , got the excellent film pore filling deposition process results, achieved the hole filled with no hole plating of deep aspect ratio. By now, NAURA conducted a comprehensive product layout in the field of IC, LEDs and semiconductor and for the emerging market such as IGBTs, MEMS, it starts to develop new PVD and industrialization for complementing the main PVD system effectively.