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  LCD - Advanced Energy - Power Supply System - RF POWER SYSTEMS



icon Paramount® RF Power-Delivery Systems
  Digitally controlled RF power supplies from 400 kHz to 60 MHz, and power from 1.5 to 8 kW, with frequency tuning, pulsing, and pulse synchronization—With full digital control and dynamic response to plasma changes, the Paramount® platform keeps you at the leading edge of process innovation.
icon Apex® RF Power-Delivery Systems
  The versatile Apex® family of RF generators and power-delivery systems utilizes sophisticated RF-conversion technology to offer enhanced product and process reliability, in a modular design suitable for chamber mounting. The Apex platform delivers superb performance in plasma-based, thin-film processes for semiconductor, flat panel display, or data storage manufacturing.
icon HFV® Variable Frequency (~2 MHz) Generators
  Used primarily as a plasma generator for 200 and 300 mm wafer processing, flat panel display (FPD), and DVD equipment, the flexible HFV® generator offers process consistency for ionized physical vapor deposition (IPVD), CVD, and etch. This versatile power generator’s features include digitally synthesized variable-frequency output and microprocessor control, with output power levels of 5 and 8 kW. In addition, it delivers an output frequency range of 1.765 to 2.165 MHz. Frequency tuning parameters that reside in firmware may be customized to ensure repeatable operation with a wide variety of chamber configurations and process recipes.
icon CESAR® RF Power Supplies
  The robust and versatile Cesar® platform offers exceptionally consistent RF power-delivery performance, as well as a diverse selection of models, each with a unique set of features and capabilities (2, 4, 13.56, 27.12, and 40.68 MHz; 0.3 to 5 kW; with a variety of user interfaces and input options). This enables you to choose a unit suited specifically to your application—without lengthy custom-generator lead times. High-quality components and a low part count maximize reliability and product lifetime, making the most of your investment—and your process productivity. A comprehensive, yet highly intuitive operating menu, accessible on the unit’s active front panel and displayed on a large LCD, provides unparalleled ease—increasing operator efficiency and minimizing training costs.
icon HiLight™ RF Generators
  Compact, lightweight, and air-cooled, HiLight™ RF generators (13.56 MHz, 600 W) are designed to easily install in locations other than traditional 19” rack mounts. This economical product family is ideal for low-power on-board applications, suiting 13.56 MHz plasma and 1 or 2 MHz megasonic processes. HiLight generators are CE compliant and controlled via a 25-pin analog user port.
icon Integro™ RF Generators
  The economical Integro™ RF generator combines a 13.56 MHz, 600 W RF power supply with an auto matching network in a single compact package. This saves valuable space and eases integration. Its enabling features include pulse mode and CEX operation.
icon Ovation® VHF Power-Delivery Systems
  The Ovation® fully-integrated, power delivery system enables faster, higher-precision processes, such as those required for demanding narrow-linewidth, dielectric etch processes, through the implementation of a unique power delivery scheme. It is the first to accurately deliver power into a non-50-ohm environment without an external sensor, reacting faster than traditional power supplies. The 60-MHz design reduces voltage potential across the plasma sheath, minimizing ion etch damage, thus improving film quality and yields.
icon Navigator® II Digital Matching Network With A Solid-State Technology Option
  Navigator® II matching networks provide the fast, controlled plasma ignition and matching that your thin-film processes demand today and support tomorrow’s more sophisticated processing needs. Take advantage of the fastest matching available to produce thinner films and finer features in your complex, multi-step processes.
Available at power and frequencies up to 30 kW and 60 MHz for semiconductor, FPD, and MEMS manufacturing processes, Navigator II digital networks match plasma impedance through rapid process changes. A model-based adaptive tuning algorithm drives reliable ignition as well as direct tuning trajectories to the final matched state. Advanced digital measurement and control ensure accurate and reliable matching over a wide pulse frequency and duty cycle range, even during pulsed operation.
The solid-state FastCap™ option features patented, hot-switchable variable capacitors that replace slower-moving vacuum capacitors. High-speed matching is accomplished by moving the capacitor directly from one position to another in < 10 ms—at the same pace as your real-time process transitions
icon Navio™ Digital Matching Network - IMPEDANCE MATCHING NETWORKS
  Advanced Energy (AE) has extended its digital matching network platform to include simplicity yet high reliability in one of the most affordable matching networks on the market today. Available in multiple power ranges and frequencies, the Navio™ matching network leverages our proven power expertise to precisely match the complex impedance of a plasma to your desired tuning range—quickly, accurately, and repeatably. Choose from a standard offering or a configurable design to meet your specific requirements. Installation is virtually plug-and-play with AE’s RF power supplies, and monitoring and control is available with Virtual Front Panel (VFP) software.
icon GenCal™ RF measure system
  The GenCal™ system provides industry-leading measurement accuracy at the discrete frequencies commonly used in the plasma process industry, and the same state-of-the-art hybrid power sensor technology used by AE's R&D award-winning plasma impedance sensor. This optimized technology provides measurements in the presence of plasma-generated signals that have high harmonic content and noise with accuracy rates not currently available in other power measurement instruments.
icon RF CABLES & ACCESSORIES
  RF Wire and accessories <More detail>
 
 
 
 
 
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