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  LCD - Advanced Energy - Power Supply System - DC Power Supply



icon Ascent® AMS DC Power Supplies—30, 40, and 60 kW
  Industry-leading arc management—stable power delivery through extreme arc conditions, for highly repeatable films As manufacturing techniques advance, new materials and cathode designs pose greater challenges to process stability and film repeatability. Ascent® AMS power supplies deliver stable, repeatable power, regardless of process material or cathode design.
icon Pinnacle® Series
  The field-proven Pinnacle® platform of DC power supplies delivers remarkable process consistency and control for significantly reduced variation and higher yields. This compact, versatile package offers the lowest stored energy, fastest arc response, and widest full-power operational impedance range in the industry.
icon Pinnacle® Plus+ Pulsed-DC Power Supplies
  The Advanced Energy® (AE) Pinnacle® Plus+ power supply provides all of the advantages of a pulsed-DC solution for your reactive processes—in a one-box package that delivers additional benefits in the form of ease of use, cost savings, and superior flexibility. Combining standard DC technology and process-proven pulsed-DC technology patented by AE in the 1990s, the Pinnacle Plus+ power supply provides higher deposition rates, more repeatable performance, and exceptional film quality compared to complicated and expensive AC-power solutions. The Pinnacle Plus+ product line consists of single-output 5 kW and 10 kW models, as well as a dual output 5 kW model.
icon Pinnacle® 3000
  The Advanced Energy Pinnacle® 3000 DC power supply provides the highest efficiency and power factor available, resulting in the lowest operating and installed cost in the industry. Pinnacle process consistency and control deliver the additional benefits of significantly reduced variation and higher yields for both process and bias applications.
icon Pinnacle® Diamond™
  In both process and bias applications, the Pinnacle® Diamond™ DC power supply provides the highest efficiency and power factor available, resulting in the lowest operating and installed cost in the industry. Remarkable Pinnacle process consistency and control deliver the additional benefits of significantly reduced variation and higher yields—all from one exceptionally compact unit.
icon MDX Series 500 W
  The MDX 500 is intended for continuous hard use in a vacuum environment, providing multi-level suppression and quenching of different types of arcs in the magnetron environment. It is a leading performer in basic magnetron sputtering, DC sputtering with RF bias, and DC-biased RF sputtering. Its small size makes it well suited for laboratory systems and small-scale production environments.
icon MDX Series 1 kW and 1.5 kW
  Tight regulation, superior arc quenching, and low stored output energy make MDX Series DC power supplies an industry leader. Intended for continuous hard use in a vacuum environment, these rugged power supplies are most commonly used as DC magnetron sputtering drives. They also offer tight regulation as bias supplies in RF sputtering and etching systems. Their compact design makes them the primary choice for laboratory systems.
icon E'Wave® Bipolar Pulsed-DC Series
  The Advanced Energy E'Wave® bipolar pulsed DC power supply improves surface uniformity and reduces additive consumption for the copper-plating phase of dual-damascene process flow (DDPF) applications, including wafer electroplating in a production environment and copper process development. The E'Wave power supply offers up to three channels, each of which has an independently driven bipolar power source and is capable of producing, storing, and running up to 15 current-controlled or voltage-controlled waveforms.
 
 
 
 
 
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