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  Semiconductor III-V Group - Tera Simicon Corp. - Diffusion & LP-CVD Furnace



Diffusion & LP-CVD Furnace
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TERA provides heat treatment equipment that can be applied to various highly matured low temperature/medium temperature/high temperature heat treatment process necessary for the most advanced semiconductor mass production line within a temperature range of 100XC~1,350XC. The heat treatment system of TERA is applied to mass production at local/overseas sites of customers, in large quantities, on the basis of the thickness dispersion of verified credibility, as well as high productivity.
Main Features:
Standard Certification:
Application:
Specification:
 
 
 
 
 
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