Tera Semicon Corporation’s 300mm semiconductor equipment
comes in various models, which work over a wide range of temperatures from 100℃~ 1,350℃
and have been supplied to pyro/annealing processes and LPCVD process. High-temperature
annealing equipment adopts a new and innovative technology, which offers a fundamental
solution to existing technical difficulties and is gaining recognition in domestic and international markets.
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Company Profile
Semiconductor III-V Group - TERA -
Diffusion & LP-CVD Furnace
