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1. Original design with 100% own intellectual properties (IP)
2. Unique platform design enables world’s leading productivity & CoO
3. Used for the production of 90-95 nanometer integrated circuit
4. Capable to extend technologically to 32 to 45 nanometers
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| Main Features: |
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1. Optional 8” conversion kit
2. Unique platform structure design allows the equipment to become a leading capacity in the world
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| Standard Certification: |
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1. Company obtained certificates of ISO9001、ISO14001、OHSAS18001
2. Products obtained certificates of SEMI S2 and F47
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| Application: |
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1. High-quality process of SiO2, SiN, SiON, and TEOS oxide films
2. Low temperature（＜200℃）process ready for TSV applications
3. Low-k capable
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| Specification: |
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1. Automation PECVD equipment
2. Single-chamber PECVD equipment
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Company Profile
Semiconductor III-V Group -
Piotech - PF-300T