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  Semiconductor III-V Group - HPSP - GENI-sys: High Pressure Annealing Furnace

GENI-sys: High Pressure Annealing Furnace

icon High Pressure Annealing Furnace
Pressure: 1 V 25 ATM
@•BKM V 20 ATM
Temperature: 300XC V 450XC
@•BKM V 400 XC
Annealing / Diffusion various gases
@•BKM V 100%H2 or D2
icon N2 Load Lock to minimize O2 level
Less 10ppm
icon Batch Process
75 wafers batch for HVM
Tput ~ 18 wph (BKM process)
icon Automated High Volume Production
SECS / GEM300 factory compliant
icon SEMI S-2 / CE Compliance
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