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Semiconductor III-V Group - Neutronix_Quintel - Model 4004



Model: 4004
Contact Mask Aligner (2”to 4”)


- Substrate size from pieces to 100 mm diameter

- Manual X, Y and theta alignment stage

- Vacuum / Pressure Contact Exposure Modes

- Manual tray loading feature
- Split field/ Single field optical microscope

- Simple, topside mask loading

- User friendly

- Low maintenance

- Available Options:

Infrared (IR) back side alignment

UV / NUV exposure optics

Carousel loading

CCTV Viewing


 
 
 
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