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  微機電 - Applied MicroStructures Inc. - Molecular Vapor Deposition (MVD150/300® MVD100 (Manual)



Molecular Vapor Deposition (MVD150/300® MVD100 (Manual)
Patented deposition process
Enabling technology for the following applications:
Anti-stiction
Surface energy control: Hydrophobic/Hydrophilic
Corrosion/Oxidation protection
Moisture barrier
特點:
icon Capable of ALD and MVD Processes
Low Processing Temperature
Integrated Microwave Plasma
Up to 4 Precursors
Batch Wafers (up to 25X 12”)
標準規範:
icon Precise chemical delivery and layer thickness control
Extremely conformal films down to sub-nanometer scale
Proven capability at high aspect ratios
Scalable from small to large substrate areas
Low Temperature Deposition for sensitive materials (>35˚C >150˚C)
Expertise at organic and inorganic film deposition
Semi S2/S8 certified
GMP Part 11
應用:
icon Improved density of functional layers
Improved adhesion of functional layers to substrate materials
Improved mechanical durability
Improved chemical resistance
Barrier layer coating
ALD process Al2O3, SiO2, TiO2, Ta2O5, HfO2, ZnO
規格:
icon Manual Loading
- 200/300mm wafer
- Other substrates possible
- Other size substrates <300mm possible with custom cassette and EFEM hardware and programming
- Batch Process
- Best Particle Control
- Process cassette is fixed in the process chamber, other cassettes only for transport
 
 
 
 
 
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