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  半導體III-V 族 - ULVAC - 物理氣相沉積設備 Entron Ex-W300



物理氣相沉積設備 Entron Ex-W300
icon
icon NAND,DRAM,Logic & TSV
icon PVD 11 % share @ W/W *1
icon Low CoO, Stable, Easy process & wide process window
icon Flexible on stress control
應用於Logic, NAND, DRAM, TSV, LED & Power Device etc 半導體光電產業之薄膜沈積設備具有高產出,低成本之競爭優勢。
 
 
 
 
 
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