 |
| |
|
 |
產品介紹 |
| |
|
|
|
 半導體III-V 族 - RAVE -
Merlin: Repairing mask and removing particle contamination by nanobit technology
以鑽石鍍膜針頭修補光罩及去除光罩上污染微粒 |
 |
Merlin: Repairing mask and removing particle contamination by nanobit technology
以鑽石鍍膜針頭修補光罩及去除光罩上污染微粒 |
|
|
| Merlin®–Critical Performance Specifications: |
 |
Nanomachinable Materials: Chrome, MoSi, Quartz, Opaque MoSi, EUV, Foreign Materials, Persistent Unknown Particles |
|
Edge Placement: ≤ 50 Å (± from target) All Materials |
|
Depth (Z) Control: ≤ 30 Å (± from target) All Materials |
|
Comprehensive pattern copy of large and complex geometries |
|
|
|
公司簡介
