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  半導體III-V 族 - ClassOne - 批次式清洗旋乾機 Trident™ Spin Rinse Dryer



批次式清洗旋乾機 Trident™ Spin Rinse Dryer
Spin Rinse Dryer (SRD) for 75-200mm Substrates
Trident系列旋轉清洗乾燥機(SRD)主要用於濕式製程後的清洗,在清洗和乾燥晶片方面提供了最先進的技術。 非接觸式加熱系統,在加熱器後面放置一個過濾器,消除了N2和加熱器之間的直接接觸,因而產生更清潔的N2。
Trident SRD還使用超純度且高品質的閥門和配件,系統的顯示和控制整合到面板上,可精確控制壓力和流量。 這些精典的設計給予Trident SRD獨特且吸引人的高性價比。
Trident SRD旋轉式沖洗乾燥機有單槽和雙槽配置,晶圓尺寸為75mm至200mm。
特點:
icon 1. Stainless Steel Cabinetry
2. Negative-Pressure Motor Seal
3. Non-Contact Ultra-Pure N2 Heater
4. Uniform Water Spray
5. Full-Control Facility Panel
6. Door-top DC Ionizer
7. Full Wrap-Around Bowl Heater
8. PLC Control with Color Touch Screen
標準規範:
icon Solstice Plating System
Best of West Winner
Semicon West 2015
應用:
Processes for Spray Solvent Tools
■ Spin, Rinse, and Dry semiconductor wafers without leaving water spots and films after a wet process
■ Chemical or residue removal
■ Cleaning up to 200mm wafers utilizing DI Water Rinse, followed by heated N2 dry
Major Benefits
■ FM4910 compliance
■ Much cleaner seal, reduced particles
■ Cleaner N2
■ Uniform rinse, no nozzle replacement
■ Precise control of flows and pressures
■ Reduced particles
■ Optimum drying performance
■ All Spin Rinse Dryer components readily available
規格:
icon
 
 
 
 
 
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